DMM-05 Industrial microscope
DMM-05 Industrial microscopewith large platform is equipped with an object stage in a large moving range, Vertical Illuminator, plat infinity objective lens with long working distance which can observe under light or dark field, eyepieces in broad view, imaging clearly and good contrast. It is developed mainly for the semiconductor industry, silicon wafer manufacturing, electronic information industry and metallurgical industry in the use of advanced industrial microscopes. It can observe under light and dark field with vertical polarized light and make DIC observation, which is widely used in the inspection and analysis of silicon, circuit substrates, FPD and precision molds in factories, research institutions, colleges and universities.
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Technical Specifications |
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Observing Viewer |
30 angle articulated trinocular(50mm-75mm) |
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Eyepiece |
WF10x/25mm |
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WF10x/20mm,with 0.1mm cross line reticle |
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Nosepiece |
Five-Arch nosepiece with DIC socket under light or dark field |
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Objective lens |
With flat infinity long working distance objective lens under light or dark field: 5x/0.1B.D/W.D.29.4mm
10x/0.25B.D/W.D.16mm
20x/0.40B.D/W.D.10.6mm
40x/0.60B.D/W.D.5.4mm |
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Platform |
double-deck movable platform |
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Size of platform: 350mmx310mm |
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Moving range:250mmx250mm |
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Color Filter |
Color filter Looked like flashboard(Green, blue, Neutral ) |
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Focus |
Coarse or fine coaxial focusing with pinion and rack driving device. scale value 0.002mm |
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Illuminator |
Vertical illuminator:with aperture and field stop, 12V/100W, AC85V-230V halogen bulbs and adjustable brightness |
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Polarized light device |
With 360 angle movable Analyzer, the analyzer and polarizer can be moved out of optical path. |
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Inspection tool |
Dynamic high precision measurement software, 1.3~9.0 Megapixel high speed and definition camera |
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